Desktop ALD

Tags:

1. The smallest desktop ALD for R&D, weighing just 50 kg

2. The most widely used applications: Semiconductor, High-K dielectrics, Nanocatalyst, Perovskite, Nanomaterials

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Product Description

1. Compact, quiet, user-friendly

2. Uniform and controllable ALD

3. Sample loading of 4/6 Inch or gram-level powder

4. Full automated human-machine operation interface

5. 4 sets of quick-release precursor modules, wafer drawer loading

6. Optimal R&D solution for advanced energy materials and novel nanomaterials

Specification

Dimension(L x W x H)	590 x 470 x 470 (mm)
Weight	70KG
Power Supply	220VAC 50HZ rating：1.5kW/7A，Peak power 2.2kW/10A
Sample Size	Up to 6 inch wafer and smaller chips compatible；Sample height≤3mm
Ultimate Vacuum	≤50 mTorr
Process Temperature	RT 360°C
Precursor temperature	Maximum 180°C
Coating Uniformity	Standard process：Aluminum oxide uniformity≤1% Film thickness：30nm

Application

1. Energy material

2. Nanomaterials

3. Semiconductors

4. Sensors

Related FAQs

What are features and highlights of MINI？

It features a high level of integration, with only the size of an oven, making it compact and space-saving. It supports a wide range of processes and can fabricate materials such as HfO₂, ZnO, Al₂O₃, and TiO₂.

What is the maximum wafer size that MINI can produce？

MINI is a monolithic (single-wafer) research equipment capable of accommodating standard 6-inch wafers at maximum, and can also process small quantities of powdered samples (3g).

What are the applications of MINI?

Semiconductor field: High-K dielectrics, supercapacitors, diodes, etc.; Nanocatalyst field: Photocatalysis, electrochemical catalysis; Perovskite solar cells.

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