CLASSIFICATION

Thermal Batch ALD
Thermal Batch ALD

Thermal Batch ALD

Tags:

Mini/Micro LED

Microelectronics

VCSEL

Automotive Chip

It is a dedicated themal ALD designed for 4/6-inch LED manufacturing lines, comprising process chamber, motion control system and load/unload platform.

Designed to meet the  requirements for graphical and planar sapphire substrate micro-nano device oxidation layer packaging and coating

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Product Description

 1.  Increases throughput while reducing COO

 2.  Scalable modular design maintains coating quality when expanding capacity/chambers

 3.  Unique gas flow design achieves:Within-wafer (WIW) non-uniformity <1.5%, Wafer-to-wafer (W2W) <2.5%, Batch-to-batch (B2B) <2.5%

 4.  Exclusive exhaust treatment system extends vacuum pump maintenance cycles, reducing costs


Specification

XPS O/Al ratio >1.40
Breaking Voltage >7.0
Film density 2.99 g/cm³
Uniformity≤1.5%
Process chamber temperature limit

≤ 250°


Application

 1.  MiniLED

 2.  MicroLED

 3.  VCSEL

 4.  Microelectronics


Related FAQs

What is the throughput capacity of this equipment?

4-inch wafers: 400 pieces per run; 6-inch wafers: 300 pieces per run

How is the temperature control uniformity of this system?

The process chamber features a dual inner/outer cavity design, delivering exceptional temperature control uniformity.

How does the system control particle contamination?

The chamber features high-vacuum transfer technology and delivers exceptional particle performance, enabling ultra-clean production.

Thermal Batch ALD

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