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plasma-enhanced ALD
Optics
AR/VR
Automotive Lens
Surveillance Lens
PEALD realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO₂, Al₂O₃, TiO₂) on various substrates, including lens, glass, organic materials, polymers, metals, and ceramics.
Product Description
ZLD Technology’s Plasma Batch PEALD system leverages advanced Plasma Enhanced ALD technology to deliver high‑precision thin film deposition for industrial applications. Designed for large‑scale production, this system features a multi‑chamber batch process that significantly increases throughput while reducing production costs. Achieving ultra‑low reflectivity anti‑reflective (AR) coatings with reflectance as low as <0.05% across the visible spectrum, it ensures exceptional uniformity and repeatability. Ideal for applications in optics, third‑generation semiconductors, and integrated circuit manufacturing, the Plasma Batch PEALD system provides reliable and high‑quality thin films on substrates such as glass, polymers, metals, and ceramics.
Advantages
1. Batch-process multi-chamber design significantly increases throughput while dramatically reducing ALD production costs
2. Industry-leading coating uniformity, repeatability, and reliability
3. Enables conformal deposition on entire lens surfaces and 3D micro/nano structures
Specification
| 12-inch wafer Ru film thickness non-uniformity | <1% |
| Batch-to-batch Ru film thickness non-uniformity | <1% |
| Reflectance (R) at visible spectrum | < 0.05% |
| Film thickness accuracy of the AR coating | 0.1 nm |
Application
1. Advanced Optical Films (AR)
2. Third Generation Semiconductors
3. Integrated circuit manufacturing
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