English
English
Tags:
Magnetic Materials
Lithium-ion batteries
Ternary Materials (NCM)
Solid-State Batteries
Catalysts
ZLD-PW-1000 enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control. The capacity is up to 100 g/1000 g.
Product Description
ZLD-PW-1000 provides Atomic Layer Deposition for the cathode and anode materials used in new-energy batteries such as lithium-ion and solid-state batteries and other applications requiring uniform, precisely controllable powder coatings. Whether applied to battery materials, catalysts, metal powders, or advanced nanomaterials, this system empowers research institutions and high-end laboratories to perform atomic layer deposition experiments, driving material innovation and process breakthroughs.
1. Customizable for batch & scalable production
2. Proprietary nano-ALD ensures uniform, high-coverage coating
3. Complete coating for ultra-high surface area materials
Utilizes atomic layer deposition (ALD) for self-limiting, single-atom layer growth, enabling precise control of film thickness. Designed to coat powders uniformly, including high-aspect-ratio and complex structures.
Specification
| Sample Capacity | 100g/1000g (customizable) |
| Reaction Temperature | RT-300°C |
| Precursor Heating | RT-200°C |
| Coating Non-uniformity | <3% |
| Ozone Generator | Optional Configuration, Production Efficiency: 15 g/h |
| Deposition Rate | 1-2Å/Cycle (AI2O3) |
| High-Aspect-Ratio | Achieves conformal coverage without voids, even on complex particle surfaces |
| Material Flexibility | Oxides (Al₂O₃, SiO₂), carbides (SiC), and other functional materials |
Application
1. Lithium-ion batteries
2. Metallic powders
3. Alloy powders
4. Catalysts
Related FAQs
RELATED PRODUCTS
ZLD-TB-3 Thermal Batch ALD (Multi-Chamber)
ZLD Technology’s ZLD-TB-3 Thermal Batch ALD (Multi-Chamber)) system leverages advanced Thermal Atomic Layer Deposition technology to deliver high-precision thin film deposition for industrial applications.It is a dedicated themal ALD designed for 4/6-inch LED manufacturing lines, comprising process chamber, motion control system and load/unload platform.
Learn More
ZLD-DP-6 Double-sided coated PEALD
ZLD-DP-6 adopts an exclusive design for double‑sided coating, enabling simultaneous and uniform deposition on both sides of the sample without the need for secondary flipping. This greatly improves production efficiency and film uniformity, making it suitable for high‑end applications with strict requirements on double‑sided film performance.It is also equipped with a fully automatic wafer handling system, realizing unmanned sample transfer throughout the process. This not only enhances operational efficiency but also fundamentally eliminates contamination risks caused by manual handling.
Learn More
ZLD-PW-1000 enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control. The capacity is up to 100 g/1000 g.
Learn More
ZLD-DT-6 is the world's smallest Atomic Layer Deposition equipment for university, laboratory, which can realize controllable atomic layer deposition on 4/6-inch wafers and micro and nanopowders in high uniformity. It is the the best solution to research and application of advanced energy materials and new nanomaterials.
Learn More
ZLD-SP-4MG Multi-Chamber UHV Magnetron Sputter
ZLD-SP-4MG can be optionally configured with multiple chambers, including one load-lock chamber and multiple sputtering chambers. It is the cutting edge vacuum system for novel materials. It supports Magnetron Sputtering for ITO Film and Seed Layer Based Process.
Learn More
ZLD-ALD-12CL 8"/12" ALD Cluster System
ZLD-ALD-12CL balances both R&D and volume production requirements. It fully retains its mature and stable process performance, supports both thermal and plasma-enhanced (PE) modes, and consistently maintains its core advantage of low-oxygen thin-film deposition.
Learn More
ZLD-PB-300E Plasma Batch ALD (EFEM)
ZLD-PB-300E Plasma Batch ALD (EFEM) enables low-temperature, high-quality PEALD processing, allowing premium optical films—such as SiO2, Al2O3, and TiO2—to be deposited onto temperature-sensitive substrates. It can also grow a variety of ALD films on bases made of glass, silicon wafers, ceramics, organic materials, polymers, metals, and other materials.
Learn More
ZLD-CL-4DT 4 Chamber UHV Evaporator
ZLD-CL-4DT includes four process chambers: load-lock (pre-treatment) chamber, ion milling chamber, evaporator, oxidation chamber. Specially designed manipulator allows tilting and rotation of wafer with little friction. Fully automatic operation guarantee reproducible results. QBT-J is the advanced solution to tunneling junction, optical structure, metal-insulator-metal structure, capacitor and so on.
Learn More
Designed for R&D and Widely Used in：
1.Battery Applications: Enhances battery performance
2.Catalysis Applications: High-efficiency catalysts
3.Metal Powder Processing: Improves powder flowability
4.Advanced Materials Development