English
English
Tags:
Semiconductor
Nanomaterials
Perovskite
Powder Coating
TEM/FIB sample preparation
It is the world's smallest atomic layer deposition equipment for university, laboratory, which can realize controllable atomic layer deposition on 4/6-inch wafers and micro and nanopowders in high uniformity. It is the the best solution to research and application of advanced energy materials and new nanomaterials.
Product Description
1. Compact, quiet, user-friendly
2. Uniform and controllable ALD
3. Sample loading of 4/6 Inch or gram-level powder
4. Full automated human-machine operation interface
5. 4 sets of quick-release precursor modules, wafer drawer loading
6. Optimal R&D solution for advanced energy materials and novel nanomaterials
Specification
| Dimension(L x W x H) | 590 x 470 x 470 (mm) |
| Weight | 70KG |
| Power Supply | 220VAC 50HZ rating：1.5kW/7A，Peak power 2.2kW/10A |
| Sample Size | Up to 6 inch wafer and smaller chips compatible；Sample height≤3mm |
| Ultimate Vacuum | ≤50 mTorr |
| Process Temperature | RT 360°C |
| Precursor temperature | Maximum 180°C |
| Coating Uniformity |
Application
1. Energy material
2. Nanomaterials
3. Semiconductors
4. Sensors
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1. The smallest desktop ALD for R&D, weighing just 50 kg
2. The most widely used applications: Semiconductor, High-K dielectrics, Nanocatalyst, Perovskite, Nanomaterials