English
English
Tags:
Semiconductor
Nanomaterials
Perovskite
Powder Coating
TEM/FIB sample preparation
It is the world's smallest Atomic Layer Deposition equipment for university, laboratory, which can realize controllable atomic layer deposition on 4/6-inch wafers and micro and nanopowders in high uniformity. It is the the best solution to research and application of advanced energy materials and new nanomaterials.
Product Description
Desktop ALD System by ZLD Technology is a compact, high-precision Atomic Layer Deposition Equipment designed specifically for R&D applications. Engineered with advanced ALD technology, this desktop system offers researchers full control over deposition parameters while maintaining excellent film uniformity and repeatability. Ideal for universities, laboratories, and materials research centers, it enables efficient thin-film coating on wafers and smaller chips — making it an essential tool for innovation in nanotechnology, semiconductors, and energy materials.
1. Compact, quiet, user-friendly
2. Uniform and controllable ALD
3. Sample loading of 4/6 Inch or gram-level powder
4. Full automated human-machine operation interface
5. 4 sets of quick-release precursor modules, wafer drawer loading
6. Optimal R&D solution for advanced energy materials and novel nanomaterials
Oxides: Al₂O₃, SiO₂, TiO₂, ZnO, ZrO₂, HfO₂, Ta₂O₅, MgO, etc.
Nitrides: AlN, TiN, ZrN, HfN, WN
Metals: Ru, Pd, Pt, Ni, Co, W
Sulfides: MoS₂, WS₂, ZnS, TiS₂
TEM Sample Decoration: Desktop ALD can create a clear boundary for TEM imaging via high quality atomically ultra thin coating,develop high Z-contrast coating for TEM imaging, and grow conform 3D authentic decoration coating at low temperature 40-80°C.
Specification
| Dimension(L x W x H) | 590 x 470 x 470 (mm) |
| Weight | 70KG |
| Power Supply | 220VAC 50HZ rating：1.5kW/7A，Peak power 2.2kW/10A |
| Sample Size | Up to 6 inch wafer and smaller chips compatible；Sample height≤3mm |
| Ultimate Vacuum | ≤50 mTorr |
| Process Temperature | RT 360°C |
| Precursor temperature | Maximum 180°C |
| Coating Uniformity | |
| Step Coverage | Deposit on all surfaces with high aspect ratio |
| Sample Handling | Wafers require careful support; powders may require holders or trays to ensure uniform exposure and prevent contamination or aggregation |
Application
1. Energy material
2. Nanomaterials
3. Semiconductors
4. Sensors
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Learn More
1. The smallest desktop ALD for R&D, weighing just 50 kg
2. The most widely used applications: Semiconductor, High-K dielectrics, Nanocatalyst, Perovskite, Nanomaterials