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Tags:
Semiconductor
Nanomaterials
Perovskite
Powder Coating
TEM/FIB sample preparation
The Desktop ALD System by ZLD Technology is a compact, high-precision Atomic Layer Deposition Equipment designed specifically for R&D applications. Engineered with advanced ALD technology, this benchtop system offers researchers full control over deposition parameters while maintaining excellent film uniformity and repeatability. Ideal for universities, laboratories, and materials research centers, the Desktop ALD System enables efficient thin-film coating on wafers, substrates, and small components — making it an essential tool for innovation in nanotechnology, semiconductors, and energy materials.
It is the world's smallest atomic layer deposition equipment for university, laboratory, which can realize controllable atomic layer deposition on 4/6-inch wafers and micro and nanopowders in high uniformity. It is the the best solution to research and application of advanced energy materials and new nanomaterials.
Product Description
1. Compact, quiet, user-friendly
2. Uniform and controllable ALD
3. Sample loading of 4/6 Inch or gram-level powder
4. Full automated human-machine operation interface
5. 4 sets of quick-release precursor modules, wafer drawer loading
6. Optimal R&D solution for advanced energy materials and novel nanomaterials
Specification
| Dimension(L x W x H) | 590 x 470 x 470 (mm) |
| Weight | 70KG |
| Power Supply | 220VAC 50HZ rating：1.5kW/7A，Peak power 2.2kW/10A |
| Sample Size | Up to 6 inch wafer and smaller chips compatible；Sample height≤3mm |
| Ultimate Vacuum | ≤50 mTorr |
| Process Temperature | RT 360°C |
| Precursor temperature | Maximum 180°C |
| Coating Uniformity |
Application
1. Energy material
2. Nanomaterials
3. Semiconductors
4. Sensors
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1. The smallest desktop ALD for R&D, weighing just 50 kg
2. The most widely used applications: Semiconductor, High-K dielectrics, Nanocatalyst, Perovskite, Nanomaterials