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ZLD offers a high-performance product portfolio from ALD to UHV systems tailored for R&D applications, providing universities and research institutions with a diverse range of thin-film deposition solutions.
Industrial products are designed for mass production and manufacturing applications. ZLD's independently developed Atomic Layer Deposition (ALD) system delivers high-precision, ultra-stable, and exceptionally uniform nano-coatings, enabling cutting-edge applications across optics, Micro/Mini LED, and automotive semiconductor manufacturing.
Thin film deposition is the process of applying extremely thin layers of material onto a surface to modify its physical, electrical, optical, or mechanical properties. Thin films can enhance performance, add functionality, or serve as protective coatings. They are essential in advanced technologies such as semiconductors, optoelectronics, energy storage, and superconducting devices.ZLD’s Thin Film Deposition Systems and frontier ultra high vacuum coating equipment provide precise, high-quality deposition solutions for both research and industrial applications.
1.Physical Vapor Deposition (PVD): Techniques such as magnetron sputtering and electron-beam evaporation physically transfer target materials onto a substrate, delivering high-purity thin films and enabling complex multilayer coating structures.
2.Chemical Vapor Deposition (CVD): CVD uses controlled chemical reactions of gas, liquid, or solid precursors to produce high-performance coatings. It is widely used in advanced semiconductor manufacturing, energy-storage materials, and other high-tech thin-film applications.
3.Atomic Layer Deposition (ALD): ALD provides ultra-uniform, atomically precise coatings ideal for next-generation technologies including lithium-ion batteries, semiconductor devices, and superconducting materials. ZLD offers desktop, powder-processing, industrial-scale PEALD and Thermal ALD systems as part of its comprehensive Thin Film Deposition System portfolio for both R&D and mass production.
Thin film deposition offers a wide range of performance and manufacturing benefits across modern industries:
1.Improved Durability & Chemical Resistance: Coatings enhance surface hardness, corrosion resistance, and overall material lifetime.
2.Enhanced Optical & Electronic Performance: Thin films enable precise control of optical, electrical, and thermal properties for next-generation devices.
3.Complex Multilayer Structures: Advanced deposition techniques allow stacking of multiple functional layers on diverse substrates.
4.Support for Miniaturization: Essential for compact, high-density electronics, sensors, and energy-storage devices.
5.High Precision & Scalability: Suitable for both laboratory R&D and high-volume industrial production.
1.Semiconductors: Coatings for microchips,advanced device fabrication,SiC and GaN wafers
2.Optoelectronics: Mini/Micro LEDs,AR/VR devices,Sensors,Lens
3.Alternative Energy: Lithium-ion batteries,solid-state batteries,energy storage coatings
4.Advanced Devices: Ultra high vacuum systems for Josephson junctions and other superconducting materials
5.Medical Devices & Aerospace: Protective and functional coatings on high-performance components
Expertise & Experience: 30+ years in thin film deposition and vacuum technology
Comprehensive Product Range: From desktop ALD systems to UHV sputter, evaporator, and PEALD/Thermal ALD for mass production
Global Reach: Over 200 clients worldwide across semiconductors, batteries, and optoelectronics
Innovative Solutions: Systems for cutting-edge applications including lithium-ion batteries, quantum devices, and next-gen semiconductors
Reliable Support: 12-month warranty, technical support, and customization services to meet specific R&D or production needs