English
English
Tags:
Diamond Microwave Plasma CVD (MPCVD)
MPCVD Diamond CVD
Diamond Film Growth / Diamond Thin Film Growth
4th-Generation Semiconductors
Wide-Bandgap Semiconductors (WBG)
Heat Sink Chip / Heat-Spreading Chip
Single-Crystal Diamond Growth / Monocrystalline Di
Polycrystalline Diamond (PCD)
Lab-Grown Diamond Equipment / Cultured Diamond Equ
High-Power Semiconductors
Product Description
Specification
RELATED PRODUCTS
ZLD-SP-4MG Multi-Chamber UHV Magnetron Sputter
ZLD-SP-4MG can be optionally configured with multiple chambers, including one load-lock chamber and multiple sputtering chambers. It is the cutting edge vacuum system for novel materials. It supports Magnetron Sputtering for ITO Film and Seed Layer Based Process.
Learn More
ZLD-PW-1000 enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control. The capacity is up to 100 g/1000 g.
Learn More
ZLD-PB-350 Plasma Batch ALD realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO₂, Al₂O₃, TiO₂) on various substrates, including lens, glass, organic materials, polymers, metals, and ceramics.
Learn More
ZLD-DC-4 Diamond Microwave Plasma CVD
ZLD-DC-4 Diamond Microwave Plasma CVD systems are core equipment for advancing fourth-generation wide-bandgap semiconductors, committed to achieving extreme growth of high-quality single-crystal and polycrystalline diamond films. Purpose-built to overcome thermal management bottlenecks in high-power chips, this system delivers an ultimate heat-sink solution for next-generation high-frequency, high-power devices while enabling frontier exploration of diamond semiconductor materials.
Learn More
ZLD-ALD-12CL 8"/12" ALD Cluster System
ZLD-ALD-12CL balances both R&D and volume production requirements. It fully retains its mature and stable process performance, supports both thermal and plasma-enhanced (PE) modes, and consistently maintains its core advantage of low-oxygen thin-film deposition.
Learn More
ZLD-DT-6 is the world's smallest Atomic Layer Deposition equipment for university, laboratory, which can realize controllable atomic layer deposition on 4/6-inch wafers and micro and nanopowders in high uniformity. It is the the best solution to research and application of advanced energy materials and new nanomaterials.
Learn More
ZLD-TB-3 Thermal Batch ALD (Multi-Chamber)
ZLD Technology’s ZLD-TB-3 Thermal Batch ALD (Multi-Chamber)) system leverages advanced Thermal Atomic Layer Deposition technology to deliver high-precision thin film deposition for industrial applications.It is a dedicated themal ALD designed for 4/6-inch LED manufacturing lines, comprising process chamber, motion control system and load/unload platform.
Learn More
ZLD-IP-500 Industrial Powder ALD
The ZLD-IP-500 Industrial Powder ALD System brings atomic-level precision coating to 500 kg-scale mass production. Its exceptional uniformity (1σ < 3%) and patented sealing technology provide dependable surface functionalization solutions for lithium battery materials, catalysts, and metal powders—directly enhancing product consistency, service life, and performance. It is the ultimate platform for achieving high-performance powder materials.
Learn More