ZLD Technology's ALD systems are at the forefront of advancing optoelectronic devices, offering precise thin film deposition for applications in LED technology, photodetectors, and optical thin film coatings. Our solutions enable the development of high-performance devices with enhanced efficiency and reliability, meeting the growing demands of the optoelectronics industry.

ZLD's independently developed batch ALD and PEALD systems are designed for cutting-edge applications including Mini/Micro LED, advanced optics, and AR/VR. These systems achieve nanoscale thin-film deposition control while maintaining high-volume production capabilities, providing key technological support to overcome industry bottlenecks in both throughput and product performance. Taking the flagship batch plasma ALD system as an example, its proprietary multi-chamber synchronous deposition technology enables uniform film deposition with <1% thickness variation on complex substrates. Notably, in optical coating applications, the system has achieved a breakthrough in depositing ultra-low-reflectance (R<0.1%) optical films across the visible spectrum, reducing optical losses by over 60% compared to conventional methods. This innovation delivers a transformative process solution for mass-producing next-gen optical devices such as:

• High-definition imaging systems

• Reliable optics for extreme environments

• Diffractive waveguides

• Metalenses

ALD in Optoelectronic Devices

Optoelectronic devices, including lasers, modulators, and photodiodes, rely on precise thin films for optimal performance. ALD provides atomic-scale control over material deposition, enabling enhanced electrical and optical properties. Engineers and researchers use ALD to improve device efficiency, stability, and interface quality in advanced optoelectronic systems.

ALD in LED Technology

In LED manufacturing, ALD is used to deposit dielectric layers, passivation coatings, and electron-blocking layers with high uniformity. This improves light extraction efficiency, thermal management, and device longevity. ALD allows LED developers to optimize optical output while maintaining high reliability across large-scale production.

ALD for Photodetectors

Photodetectors require high-sensitivity, fast-response thin films to detect light accurately. ALD enables conformal coatings on complex geometries, improving photodetector responsivity, signal-to-noise ratio, and operational stability. Researchers leverage ALD to achieve precise control over layer thickness, composition, and interface properties in next-generation imaging and sensing systems.

ALD for Optical Thin Film Coating

Optical thin films, such as anti-reflective coatings, mirrors, and filters, demand precise thickness and uniformity for optimal performance. ALD allows deposition of high-quality optical coatings with controlled refractive index and thickness, suitable for lasers, lenses, and photonic devices. Optical engineers rely on ALD for consistent, scalable, and high-precision coating solutions.

Conclusion

ALD is a versatile technology that supports a wide range of optoelectronic and optical applications. From LEDs and photodetectors to optical thin films, ALD provides atomic-scale control, conformality, and uniformity, enabling advanced device performance and reliable manufacturing.