ZLD's independently developed batch ALD and PEALD systems are designed for cutting-edge applications including Mini/Micro LED, advanced optics, and AR/VR. These systems achieve nanoscale thin-film deposition control while maintaining high-volume production capabilities, providing key technological support to overcome industry bottlenecks in both throughput and product performance. Taking the flagship batch plasma ALD system as an example, its proprietary multi-chamber synchronous deposition technology enables uniform film deposition with <1% thickness variation on complex substrates. Notably, in optical coating applications, the system has achieved a breakthrough in depositing ultra-low-reflectance (R<0.1%) optical films across the visible spectrum, reducing optical losses by over 60% compared to conventional methods. This innovation delivers a transformative process solution for mass-producing next-gen optical devices such as:

• High-definition imaging systems

• Reliable optics for extreme environments

• Diffractive waveguides

• Metalenses